標題真空鍍膜二硫化鉬Mos2納米涂層

· Coating deposition carried out using a high density of low energy bombarding ions.

使用高密度低能量轟擊離子進行沉積鍍膜。

· Deposition of very dense, non-columnar coating structures with low internal stresses.

鍍層致密度好，低柱狀晶結構，內應力低

· Deposition of coatings with dense structures at low temperatures.

• 可在低溫環境下沉積致密結構的鍍層

· High efficiency of ion cleaning resulting in coatings with the highest levels of adhesion.

高效率等離子清理以提供高的鍍層結合強度。

· Coatings quality is assured by the use of specially designed Plasmag sputter sources, which create an intense plasma ａnd high ion bombardment of work pieces.

鍍層品質保證是由使用門設計plasmag濺射源及提供高密度的等離子。